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HOME > Business > Compound Semiconductor Final Single-Wafer Cleaning System HSC-F2400
Compound Semiconductor Final Single-Wafer Cleaning System HSC-F2400

HSC-F2400 is applied to final cleaning of 4/6/8-inch compound semiconductor materials respectively. The equipment is based on the innovative technology of Hwatsing's independent intellectual property rights, equipped with superior performance single cleaner module and double-sided brushing module, integrating a variety of chemical liquids, and equipped with advanced physical cleaning methods to show more excellent cleaning effect. The equipment meets the needs of a wide range of compound semiconductor materials and has been applied in bulk in the compound semiconductor field.

Equipped with automatic compatibility of 4/6/8-inch wafer cleaning

Capable of Dry-in/Dry-out or Wet-in/Dry-out function

Better wafer process clamping mode

Equipped with double-sided brushing and double-sided single cleaning function, more efficient and convenient

Flexible configuration, better cleaning effect

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